The Keithley 4200 Semiconductor Characterization System performs lab grade DC and pulse device characterization, real-time plotting, and analysis with high precision and sub-femtoamp resolution
Raman spectroscopy equipment is a powerful tool for non-destructive and non-invasive analysis of various materials, including solids, liquids, and gases.
physical vapor deposition system by electron beam generated from a filament and steered via electric and magnetic fields to the targeted point
The equipment transferring the pattern onto the wafer by a high intensity ultraviolet light
Plasma-Enhanced Atomic Layer Deposition
Thin film deposition system incorporating plasma source and high temperature heating stage
RF magnetron sputtering is a technique where Argon ions are accelerated by a RF electric field to hit a target made of the material to sputter
Thermal Atomic Layer Deposition equipment
Thin film deposition system based on the self-limited chemical reaction
The system producing a strong electric field to induce the electrohydrodynamic instability
DC Sputter & Thermal Evaporator
DC or Direct Current Sputtering is a Thin Film Physical Vapor Deposition (PVD) Coating technique where a target material to be used as the coating is bombarded with ionized gas molecules causing atoms to be “Sputtered” off into the plasma
I-V Measurement System
An I-V measurement is a task to obtain the current vs voltage or resistance characteristics by providing a voltage/current stimulus and measuring current/voltage reaction. It is a basic electric measurement and a fundamental way to discover behavior and characterize the following devices.